Assignment of Assignor's Interest

Recorded: 1993-11-30 Pages: 2

Assignor

IKEDA, YASUO

Executed: 1993-11-19

Assignee

NEC CORPORATION

7-1, SHIBA 5-CHOME, MINATO-KU, TOKYO, JAPAN

Covered Property (1)

Chemical Vapor Deposition Method for Forming SIO2

Patent: 5,462,899 →

Application: 08/159,235 →

Related Assignments (2)

Other recorded transfers of the patent in this record — the chain of ownership.