IP Library › Assignment 007562/0872
Patent Assignment
Reel/Frame 007562/0872

Merger

Recorded: 1995-07-20 Pages: 118
Assignor
AMERICAN HOECHST CORPORATION
Executed: 1987-04-29
Assignee
HOECHST CELANESE CORPORATION
ROUTE 202-206 NORTH, SOMERVILLE, NEW JERSEY, 08876
Covered Properties (42)
Lithographic Plate Finisher
Patent: 4,213,887 →
Application: 06/058,235 →
Lubricant for Heat Processing of Vinyl Chloride Resins
Patent: 4,246,150 →
Application: 06/076,524 →
Light-Sensitive Color Proofing Film with Surfactant Inalight-Sensitive Coating
Patent: 4,299,906 →
Application: 06/154,737 →
Light Beam Scanning Apparatus
Patent: 4,323,307 →
Application: 06/157,147 →
Process for Heating Exposed and Developed Light-Sensitive Lithographic Printing Plates with Carboxylic Acid and Amine Moiety Containing Compounds on Surface Thereof
Patent: 4,355,096 →
Application: 06/167,615 →
An Aqueous 2-Propoxyethanol Containing Processing Composition for Lithographic Printing Plates
Patent: 4,308,340 →
Application: 06/176,363 →
Assembly for Processing a Photosensitive Material
Patent: 4,332,454 →
Application: 06/223,610 →
A Method of Converting and Separating Substances Contained, Dissolved or Dissolvable in a Carrier Liquid
Patent: 4,436,624 →
Application: 06/246,933 →
Aluminum Support Useful for Lithography
Patent: 4,581,996 →
Application: 06/357,926 →
Light-Sensitive Polymeric Diazonium Gondensates and Reproduction Compositions and Materials Therewith
Patent: 4,436,804 →
Application: 06/359,335 →
Electrolytic Graining of Aluminum with Nitric and Oxalic Acids
Patent: 4,374,710 →
Application: 06/359,338 →
Negative Working Diazo Contact Film
Patent: 4,448,873 →
Application: 06/359,460 →
Sulhur and/or Amide-Containing Exposure Accelerators for Light-Sensitive Coatings with Diazonium Compound
Patent: 4,446,218 →
Application: 06/359,629 →
Electrochemically Treated Metal Plates
Patent: 4,448,647 →
Application: 06/424,685 →
Novel Electrolytes for Electrochemically Treated Metal Plates
Patent: 4,452,674 →
Application: 06/424,707 →
Water Developable Dye Coating on Substrate with Two Diazo Polycondensation Products and Water Soluble Polymeric Binder
Patent: 4,469,772 →
Application: 06/458,408 →
Cleansing Agent for Printing Plates
Patent: 4,504,406 →
Application: 06/468,253 →
Light Sensitive Co-Condensates
Patent: 4,533,620 →
Application: 06/519,443 →
Aqueous Developable Diazo Lithographic Printing Plates with Admixture of Polyvinyl Acetate and Styrene Maleic Acid Ester Copolymer
Patent: 4,511,640 →
Application: 06/525,927 →
Amino Acid Stabilizers for Water Soluble Diazonium Compound Condensation Products
Patent: 4,554,236 →
Application: 06/543,566 →
Method of Developing Imaged Diazo Material with Propanol Containing Developer Composition
Patent: 4,786,580 →
Application: 06/566,125 →
Positive Working Naphthoquinone Diazide Color Proofing Transfer Process
Patent: 4,659,642 →
Application: 06/663,607 →
Negative Working Diazo Color Proofing Method
Patent: 4,650,738 →
Application: 06/663,608 →
Electrolytes for Electrochemically Treating Metal Plates
Patent: 4,578,156 →
Application: 06/680,029 →
Aqueous Developable Lithographic Printing Plates Containing an Admixture of Diazonium Salts and Polymers and Composition Therefor
Patent: 4,618,562 →
Application: 06/686,778 →
Photopolymerizable Dual Transfer Negative Working Color Proofing System
Patent: 4,596,757 →
Application: 06/720,468 →
Resin
Patent: 4,670,507 →
Application: 06/762,089 →
Water Developable Lithographic Composition
Patent: 4,772,538 →
Application: 06/762,090 →
Radiation-Polymerizable Composition and Element Containing a Photopolymer Composition
Patent: 4,652,604 →
Application: 06/762,091 →
Protective Coating for Images
Patent: 4,719,169 →
Application: 06/853,782 →
Negative Working Color Proofing Process Comprising Diazo Compound and Polyvinyl Alcohol\Polyvinyl Acetate Resin
Patent: 4,808,508 →
Application: 06/880,770 →
Negative Working Diazo Color Proofing Method
Patent: 4,751,166 →
Application: 06/906,483 →
Resin
Patent: 4,665,124 →
Application: 06/918,734 →
Radiation-Polymerizable Composition and Element Containing a Photopolymer Composition
Patent: 4,707,437 →
Application: 06/924,383 →
Overlay Proofing Film
Patent: 4,748,101 →
Application: 06/927,191 →
Positive Working Naphthoquinone Diazide Color Proofing Element with Polyvinlyl Acetate Adhesive Layer
Patent: 4,772,533 →
Application: 06/927,776 →
Desensitizing Solution for Lithographic Printing Plates
Patent: 4,783,395 →
Application: 07/117,591 →
Radiation Polymerizable Composition, Photographic Element, and Method of Making Element with Diazonium Salt, and Monofunctional and Polyfunctional Acrylic Monomers
Patent: 4,851,319 →
Application: 07/185,342 →
Overlay Proofing Film
Patent: 4,842,950 →
Application: 07/199,011 →
Water Developable Lithographic Composition
Patent: 4,895,788 →
Application: 07/199,315 →
Protected Color Image on Substrate with Thermal Adhesive and Antiblocking Overlayers
Patent: 4,999,266 →
Application: 07/449,359 →
Negative Working Diazo Resin Color Proofing Material Comprising Polyvinyl Acetal/Polyvinyl Alcohol/Polyvinyl Acetate Resin
Patent: 5,053,310 →
Application: 07/554,092 →
Related Assignments (24)
Other recorded transfers of the patents in this record — the chain of ownership.
Assignment of Assignors Interest. Jul 20, 1981
From: LIU SCHUCHEN
To: AMERICAN HOECHST CORPORATION, SOMERVILLE, NJ A CORP. OF DE
Reel/Frame 003884/0170 →
Assignment of Assignors Interest. Jul 27, 1981
From: WALLS JOHN E.
To: AMERICAN HOECHST CORPORATION
Reel/Frame 003885/0016 →
Assignment of Assignors Interest. Sep 17, 1981
From: WALLS, JOHN E.
To: AMERICAN HOECHST CORPORATION, A CORP. OF NJ
Reel/Frame 003909/0786 →
Assignment of Assignors Interest. Oct 5, 1981
From: SEELEY, DOUGLAS A.
To: AMERICAN HOECHST CORPORATION, A CORP. OF DE
Reel/Frame 003914/0470 →
Assignment of Assignors Interest. Mar 8, 1982
From: HENSEL, ROY; BILLER, LEONHARD F.; DANSON, RUSSELL J.
To: AMERICAN HOECHST CORPORATION, A CORP. OF DE
Reel/Frame 003954/0648 →
Assignment of Assignors Interest. Dec 10, 1982
From: WALLS, JOHN E.
To: AMERICAN HOECHST CORPORATION
Reel/Frame 004067/0065 →
Assignment of Assignors Interest. Dec 29, 1983
From: WALLS, JOHN E.
To: AMERICAN HOECHST CORPORATION SOMERVILLE, NJ A DE CORP
Reel/Frame 004204/0849 →
Assignment of Assignors Interest. Jan 13, 1984
From: DHILLON, MAJOR S.
To: AMERICAN HOECHST CORPORATION
Reel/Frame 004208/0647 →
Assignment of Assignors Interest. Feb 29, 1984
From: WALLS, JOHN E.; DHILLON, MAJOR S.
To: AMERICAN HOECHST CORP
Reel/Frame 004227/0175 →
Assignment of Assignors Interest. Mar 5, 1984
From: GILLICH, THOMAS N.; WALLS, JOHN E.; WANAT, STANLEY F.; ROZELL, WILLIAM J.
To: AMERICAN HOECHST CORPORATION, A DE CORP.
Reel/Frame 004228/0358 →
Assignment of Assignors Interest. Mar 5, 1984
From: GILLICH, THOMAS N.; WALLS, JOHN E.; WANAT, STANLEY F.; ROZELL, WILLIAM J.
To: AMERICAN HOECHST CORPORATION, A DE CORP.
Reel/Frame 004228/0356 →
Assignment of Assignors Interest. Jun 25, 1984
From: BARTON, OLIVER A.; WRIGHT, JAMES D.
To: AMERICAN HOECHST CORPORATION, SOMERVILLE, NJ A CORP.
Reel/Frame 004272/0617 →
Assignment of Assignors Interest. Jul 26, 1984
From: AMERICAN HOECHST CORPORATION
To: GERBER SCIENTIFIC INSTRUMENT COMPANY, SOUTH WINDSOR, CT., A CT CORP.
Reel/Frame 004286/0394 →
Assignment of Assignors Interest. Dec 24, 1984
From: DHILLON, MAJOR S.
To: AMERICAN HOECHST CORPORATION
Reel/Frame 004343/0946 →
Assignment of Assignors Interest. Jan 24, 1985
From: LIU, SHUCHEN
To: AMERICAN HOECHST CORPORATION
Reel/Frame 004353/0340 →
Assignment of Assignors Interest. May 28, 1985
From: WALLS, JOHN E.; DUNDER, THOMAS A.
To: AMERICAN HOECHST CORPORATION, A CORP OF DE
Reel/Frame 004404/0904 →
Assignment of Assignors Interest. Sep 3, 1985
From: WALLS, JOHN E.; DHILLON, MAJOR S.
To: AMERICAN HOECHST CORPORATION, A CORP. OF DE.
Reel/Frame 004450/0946 →
Assignment of Assignors Interest. Sep 3, 1985
From: BENTLEY, TRISHA
To: AMERICAN HOECHST CORPORATION, A CORP. OF DE.
Reel/Frame 004450/0945 →
Assignment of Assignors Interest. Sep 12, 1985
From: PLAZTER, STEPHAN J. W.
To: AMERICAN HOECHST CORPORATION, A CORP. OF DE.
Reel/Frame 004452/0098 →
Assignment of Assignors Interest. Jan 9, 1986
From: PLATZER, STEPHAN J.
To: AMERICAN HOECHST CORPORATION, SOMERVILLE, NEW JERSEY, A CORP OF DELAWARE
Reel/Frame 004494/0309 →
Assignment of Assignors Interest. Nov 21, 1988
From: MITCHELL, WAYNE A.
To: AMERICAN HOECHST CORPORATION, SOMERVILLE, NEW JERSEY, A CORP. OF DE
Reel/Frame 004994/0928 →
Assignment of Assignors Interest. Nov 21, 1988
From: HSIEH, SHANE
To: AMERICAN HOECHST CORPORATION, SOMERVILLE, NEW JERSEY, A CORP. OF DE
Reel/Frame 004994/0927 →
Merger Feb. 27, 1987 Nov 21, 1988
From: AMERICAN HOECHST CORPORATION
To: CELANESE CORPORATION
Reel/Frame 004994/0929 →
Change of Name Effective on 05/01/1992 Jul 20, 1992
From: GERBER SCIENTIFIC INSTRUMENT COMPANY, THE
To: GERBER SYSTEMS CORPORATION
Reel/Frame 006190/0025 →