Assignment of Assignor's Interest

Recorded: 1995-12-13 Pages: 3

Assignor

SAKURA, NAOKI

Executed: 1995-11-24

Assignee

NEC CORPORATION

7-1, SHIBA 5-CHOME, MINATO-KU, TOKYO, JAPAN

Covered Property (1)

Process of Exactly Patterning Layer to Target Configuration by Using Photo-Resist Mask Formed with Dummy Pattern

Patent: 5,763,143 →

Application: 08/571,535 →

Related Assignments (1)

Other recorded transfers of the patent in this record — the chain of ownership.