IP Library Assignment 011669/0333
Patent Assignment
Reel/Frame 011669/0333

Assignment of Assignor's Interest

Recorded: 2001-03-30 Pages: 3
Assignors
BAUM, THOMAS H.
Executed: 2001-03-29
XU, CHONGYING
Executed: 2001-03-29
HENDRIX, BRYAN C.
Executed: 2001-03-29
ROEDER, JEFFREY F.
Executed: 2001-03-29
Assignee
ADVANCED TECHNOLOGY MATERIALS, INC.
7 COMMERCE DRIVE, DANBURY, CONNECTICUT, 06810
Covered Property (1)
Source Reagent Compositions for Cvd Formation of Gate Dielectric Thin Films Using Amide Precursors and Method of Using Same
Patent: 7,005,392 →
Application: 09/823,196 →
Publication: US 2002/0175393