Patent Assignment
Reel/Frame 011905/0703
Assignment of Assignor's Interest
Recorded: 2001-05-11
Received: 2001-06-22
Pages: 3
Assignee
ATOTECH DEUTSCHLAND GMBH
ERASMUSSTRASSE 20, D-10553, BERLIN, DEX, GERMANY
Covered Property
(1)
Method for Galvanically Forming Conductor Structures of High-Purity Copper in the Production of Integrated Circuits
Application:
09/831,763 →