Patent Assignment
Reel/Frame 011906/0210
Assignment of Assignor's Interest
Recorded: 2001-06-15
Received: 2001-06-22
Pages: 2
Assignee
SILICON INTEGRATED SYSTEMS CORPORATION
SCIENCE-BASED INDUSTRIAL PARK, NO. 16, CREATION RD. 1, HSIN CHU, TWX, R.O.C, TAIWAN
Covered Property
(1)
Method for Forming a Metal Capacitor in a Damascene Process
Application:
09/880,849 →