Patent Assignment
Reel/Frame 012018/0282
Assignment of Assignor's Interest
Recorded: 2001-07-24
Received: 2001-08-02
Pages: 2
Assignee
SILICON INTEGRATED SYSTEMS CORP.
SCIENCE-BASED INDUSTRIAL PARK, NO. 16, CREATION RD. 1, HSIN CHU, TWX, R.O.C, TAIWAN
Covered Properties
(2)
Dual Damascene Process Using Metal Hard Mask
Application:
09/910,876 →
Electrical Connector
Application:
09/865,671 →