Assignment of Assignor's Interest

Recorded: 2001-09-06 Pages: 2

Assignors

NIRE, TAKASHI

Executed: 2001-08-27

MATSUNO, AKIRA

Executed: 2001-08-27

KAGAWA, KAZUHIRO

Executed: 2001-08-27

MUKOUJIMA, MIKA

Executed: 2001-08-27

Assignee

KOMATSU LTD.

3-6, AKASAKA 2-CHOME, MINATO-KU, TOKYO 107-8414, JAPAN

Covered Property (1)

Method for forming porous film, insulating film for semiconductor element, and method for forming such insulating film

Application: 09/946,635 →

Publication: US 2002/0031917

Related Assignments (1)

Other recorded transfers of the patent in this record — the chain of ownership.