IP Library Assignment 012383/0207
Patent Assignment
Reel/Frame 012383/0207

Assignment of Assignor's Interest

Recorded: 2001-11-16 Pages: 2
Assignor
MATSUOKA, AKIO
Executed: 2001-11-15
Assignee
NEC CORPORATION
7-1 SHIBA 5 CHOME, MINATO-KU, TOKYO, JAPAN
Covered Property (1)
Semiconductor device with heavily doped shallow region and process for fabricating the same
Application: 10/012,632 →
Publication: US 2002/0060353