Assignment of Assignor's Interest

Recorded: 2002-03-05 Received: 2002-03-19 Pages: 2

Assignor

LEE, SHYH-DAR

Executed: 2002-02-04

Assignee

SILICON INTEGRATED SYSTEMS CORP.

SCIENCE-BASED INDUSTRIAL PARK, NO. 16, CREATION RD. 1, HSIN CHU, TWX, R.O.C, TAIWAN

Covered Properties (3)

Image Enhancement Method

Application: 10/092,311 →

Method of Forming a Stacked Dielectric Layer on a Semiconductor Substrate Having Metal Patterns

Application: 10/087,773 →

Dielectric-Coated Ablation Electrode Having a Non-Coated Window with Thermal Sensors

Application: 09/997,820 →