Patent Assignment
Reel/Frame 012920/0396
Assignment of Assignor's Interest
Recorded: 2002-02-25
Received: 2002-07-22
Pages: 2
Assignee
ATOTECH DEUTSCHLAND GMBH
ERASMUSSTRASSE 20, 10553, BERLIN, DEX, 10553, GERMANY
Covered Property
(1)
Method of Forming a Conductive Pattern on Dielectric Substrates
Application:
10/069,417 →