Change of Name

Recorded: 2002-06-04 Received: 2002-06-10 Pages: 5

Assignor

ZARLINK SEMICONDUCTOR INC

Executed: 2002-02-22

Assignee

DALSA SEMICONDUCTOR INC

605 MCMURRAY ROAD, WATERLOO, OMX, N2V 2, OMAN

Covered Properties (14)

Method of Making Specular Infrared Mirrors for Use in Optical Devices

Application: 09/987,829 →

Method of reducing stress-induced mechanical problems in optical components

Application: 09/973,778 →

Method of Making High-Voltage Bipolar/Cmos/Dmos (Bcd) Devices

Application: 09/964,472 →

Method of Depositing an Optical Quality Silica Film by Pecvd

Application: 09/956,916 →

Method of Aligning Structures on Opposite Sides of a Wafer

Application: 09/923,367 →

Micro-Fluidic Devices

Application: 09/910,795 →

Method of Depositing Optical Films

Application: 09/867,662 →

Method of Forming Spacers in Cmos Devices

Application: 09/848,278 →

Manufacture of Integrated Fluidic Devices

Application: 09/842,836 →

Method of depositing optical quality silica films by PECVD while controlling gas pressure

Application: 09/833,711 →

Manufacture of Silica Waveguides with Minimal Absorption

Application: 09/799,496 →

Method of Making a Functional Device with Deposited Layers Subject to High Temperature Anneal

Application: 09/799,491 →

Method of Inspecting an Anisotropic Etch in a Microstructure

Application: 09/799,495 →

Method of Depositing a Thick Dielectric Film

Application: 09/775,465 →