Patent Assignment
Reel/Frame 012986/0832
Assignment of Assignor's Interest
Recorded: 2002-06-07
Received: 2002-06-19
Pages: 3
Assignee
SILICON INTEGRATED SYSTEMS CORP.
SCIENCE-BASED INDUSTRIAL PARK, NO. 16, CREATION RD. 1,, HSIN-CHU, TWX, ROC, TAIWAN
Covered Properties
(2)
Method for Improving Adhesion of a Low K Dielectric to a Barrier Layer
Application:
10/165,739 →
Cactus extract
Application:
60/272,172 →