Assignment of Assignor's Interest

Recorded: 2002-10-29 Received: 2002-11-12 Pages: 4

Assignor

OVONYX, INC.

Executed: 2002-09-09

Assignee

INTEL CORPORATION

2200 MISSION COLLEGE BOULEVARD, SANTA CLARA, CA, 95052, UNITED STATES

Covered Properties (5)

Exposed phase edge mask method for generating periodic structures with subwavelength feature

Application: 09/935,563 →

Barrier Material Encapsulation of Programmable Material

Application: 09/896,530 →

Reduced Area Intersection Between Electrode and Programming Element

Application: 09/896,531 →

Trench Sidewall Profile for Device Isolation

Application: 09/896,532 →

Compositionally Modified Resistive Electrode

Application: 09/770,968 →