Patent Assignment
Reel/Frame 013758/0519
SECURITY INTEREST
Recorded: 2003-06-27
Received: 2003-06-27
Pages: 16
Assignor
AKRION LLC
Executed: 2003-06-23
Assignee
SILICON VALLEY BANK DBA SILICON VALLEY EAST
3003 TASMAN DRIVE, SANTA CLARA, CA, 95054, UNITED STATES
Covered Applications
(19)
PROCESS AND APPARATUS FOR REMOVAL OF PHOTORESIST FROM SEMICONDUCTOR WAFERS USING SPRAY NOZZLES
App. No. 10/366,054
→
CAPILLARY DRYING OF SUBSTRATES
App. No. 10/358,636
→
CAPILLARY DRYING OF SUBSTRATES
PCTPCTUS2003003561
→
PROCESS AND APPARATUS FOR REMOVAL OF PHOTORESIST FROM SEMICONDUCTOR WAFERS USING SPRAY NOZZLES
PCTPCTUS2003001668
→
METHOD AND APPARATUS FOR REMING PHOTORESIST USING SPARGER
PCTPCTUS2003001588
→
METHOD OF PROCESSING SUBSTRATES USING PRESSURIZED MIST GENERATION
App. No. 10/304,583
→
Apparatus and method for improved acoustical energy transmission
App. No. 60/423,263
→
Automation design for cassette-less transfer of silicon wafers
App. No. 60/387,109
→
NEXTGEN WET PROCESS TANK
App. No. 10/117,778
→
MEMBRANE DRYER
App. No. 10/117,739
→
CHEMICAL CONCENTRATION CONTROL DEVICE
App. No. 10/117,725
→
PROCESS TANK WITH PRESSURIZED MIST GENERATION
App. No. 10/117,768
→
DRYING VAPOR GENERATION
App. No. 10/098,847
→
DRYING VAPOR GENERATION
PCTPCTUS2002007881
→
CLEANING AND DRYING METHOD AND APPARATUS
App. No. 10/091,011
→
METHOD AND SYSTEM FOR CHEMICAL INJECTION IN SILICON WAFER PROCESSING
App. No. 10/053,364
→
LOW PROFILE WAFER CARRIER
App. No. 10/053,449
→
SYSTEM FOR REMOVAL OF PHOTORESIST USING SPARGER
App. No. 10/052,823
→
PARTICLE BARRIER DRAIN
App. No. 10/014,121
→