IP Library Assignment 014030/0269
Patent Assignment
Reel/Frame 014030/0269

Assignment of Assignor's Interest

Recorded: 2003-10-07 Received: 2003-10-07 Pages: 4
Assignor
Assignee
INFINEON TECHNOLOGIES AG
ST. MARTIN-STR. 53, 81669 MUNICH, DEX, GERMANY
Covered Properties (6)
Method of Fabricating a Buried Collar
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Polishing Pad for Use in Chemical - Mechanical Planarization of Semiconductor Wafers and Method of Making Same
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Digital Processor with Programmable Breakpoint/Watchpoint Trigger Generation Circuit
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Teos Assisted Oxide Cmp Process
Application: 10/314,865 →
Intra-Cell Mask Alignment for Improved Overlay
Application: 10/309,291 →
Bilayer Cmp Process to Improve Surface Roughness of Magnetic Stack in Mram Technology
Application: 10/289,488 →