Assignment of Assignor's Interest

Recorded: 2003-07-24 Pages: 3

Assignors

OTAKE, TOSHIHIRO

Executed: 2003-06-23

MATSUO, MUTSUMI

Executed: 2003-06-23

TSUYUKI, TADASHI

Executed: 2003-06-23

Assignee

SEIKO EPSON CORPORATION

4-1 NISHI-SHINJUKU, 2-CHOME, SHINJUKU-KU, TOKYO, JAPAN

Covered Property (1)

Mask, Substrate with Light Reflective Film, Method for Manufacturing Light Reflective Film, Liquid Crystal Display Device, and Electronic Apparatus

Patent: 7,060,396 →

Application: 10/410,518 →

Publication: US 2003/0218698

Related Assignments (2)

Other recorded transfers of the patent in this record — the chain of ownership.