IP Library Assignment 014470/0484
Patent Assignment
Reel/Frame 014470/0484

Assignment of Assignor's Interest

Recorded: 2003-09-05 Pages: 4
Assignors
DERDERIAN, GARO J.
Executed: 2003-08-26
HILL, CHRIS W.
Executed: 2003-08-26
Assignee
MICRON TECHNOLOGY, INC.
8000 SOUTH FEDERAL WAY, BOISE, IDAHO, 83716
Covered Property (1)
Method of Depositing a Silicon Dioxide-Comprising Layer in the Fabrication of Integrated Circuitry
Patent: 7,157,385 →
Application: 10/655,699 →
Publication: US 2005/0054213
Related Assignments (2)
Other recorded transfers of the patent in this record — the chain of ownership.
Change of Name Jan 28, 2022
From: OMNIMAX INTERNATIONAL, INC.
To: OMNIMAX INTERNATIONAL, LLC.
Reel/Frame 058808/0129 →
Corrective Assignment to Correct the Nature of Conveyance, in Order to Replace "Change of Name" with "Merger and Change of Name" Previously Recorded at Reel: 058808 Frame: 0129. Assignor(S) Hereby Confirms the Change of Name. Feb 7, 2022
From: OMNIMAX INTERNATIONAL, INC.
To: OMNIMAX INTERNATIONAL, LLC
Reel/Frame 058981/0169 →