Patent Assignment
Reel/Frame 014915/0713
Assignment of Assignor's Interest
Recorded: 2004-01-22
Pages: 3
Assignors
YAMAGUCHI, SHINJI
Executed: 2003-12-11
INOUE, SOICHI
Executed: 2003-12-11
TANAKA, SATOSHI
Executed: 2003-12-11
INOUE, MARI
Executed: 2003-12-11
Assignee
KABUSHIKI KAISHA TOSHIBA
1-1, SHIBAURA 1-CHOME, MINATO-KU, TOKYO, JAPAN
Covered Property
(1)
Mask Defect Inspecting Method, Semiconductor Device Manufacturing Method, Mask Defect Inspecting Apparatus, Defect Influence Map Generating Method, and Computer Program Product
Related Assignments
(4)
Other recorded transfers of the patent in this record — the chain of ownership.
Assignment of Assignor's Interest
Aug 24, 2017
From: KABUSHIKI KAISHA TOSHIBA
To: TOSHIBA MEMORY CORPORATION
Reel/Frame 043709/0035 →
Merger
Jan 22, 2021
From: TOSHIBA MEMORY CORPORATION
To: K.K. PANGEA
Reel/Frame 055659/0471 →
Change of Name and Address
Jan 22, 2021
From: TOSHIBA MEMORY CORPORATION
To: KIOXIA CORPORATION
Reel/Frame 055669/0001 →
Change of Name and Address
Jan 22, 2021
From: K.K. PANGEA
To: TOSHIBA MEMORY CORPORATION
Reel/Frame 055669/0401 →