IP Library Assignment 015200/0813
Patent Assignment
Reel/Frame 015200/0813

Assignment of Assignor's Interest

Recorded: 2004-04-12 Pages: 3
Assignors
MORITA, NOBORU
Executed: 2004-01-26
USAMI, TATSUYA
Executed: 2004-01-26
OHTO, KOICHI
Executed: 2004-01-26
OHNISHI, SADAYUKI
Executed: 2004-01-26
ARITA, KOJI
Executed: 2004-01-26
KITAO, RYOHEI
Executed: 2004-01-26
SASAKI, YOICHI
Executed: 2004-01-26
Assignee
NEC ELECTRONICS CORPORATION
1753 SHIMONUMABE, NAKAHARA-KU, KAWASAKI, KANAGAWA, 211-8668, JAPAN
Covered Property (1)
Method of Fabricating Semiconductor Device Using Plasma-Enhanced Cvd
Patent: 7,074,698 →
Application: 10/766,921 →
Publication: US 2004/0185668
Related Assignments (1)
Other recorded transfers of the patent in this record — the chain of ownership.
Change of Name Dec 22, 2010
From: NEC ELECTRONICS CORPORATION
To: RENESAS ELECTRONICS CORPORATION
Reel/Frame 025525/0127 →