Patent Assignment
Reel/Frame 015348/0313
SECURITY INTEREST
Recorded: 2004-05-21
Received: 2004-05-21
Pages: 12
Assignor
AKRION LLC
Executed: 2004-04-28
Assignee
ORIX VENTURE FINANCE LLC
1177 AVENUE OF THE AMERICAS, 10TH FLOOR, NEW YORK, NY, 10036, UNITED STATES
Covered Applications
(22)
Method and apparatus for high selectivity silicon nitride etching
App. No. 60/533,097
→
System and method for implementing a NAND memory interface
App. No. 10/688,042
→
Reticle cleaning carrier
App. No. 60/500,856
→
METHOD FOR REMOVAL OF PHOTORESIST USING SPARGER
App. No. 10/634,440
→
Process sequence for photoresist stripping and cleaning of photomasks for IC manufacturing
App. No. 60/491,607
→
Apparatus for filtration and purification of the process/rinse fluid to the acceptable levels
App. No. 60/489,059
→
APPARATUS AND METHOD FOR CASSETTE-LESS TRANSFER OF WAFERS
PCTPCTUS2003018384
→
PROCESS AND APPARATUS FOR REMOVAL OF PHOTORESIST FROM SEMICONDUCTOR WAFERS USING SPRAY NOZZLES
App. No. 10/366,054
→
CAPILLARY DRYING OF SUBSTRATES
App. No. 10/358,636
→
CAPILLARY DRYING OF SUBSTRATES
PCTPCTUS2003003561
→
PROCESS AND APPARATUS FOR REMOVAL OF PHOTORESIST FROM SEMICONDUCTOR WAFERS USING SPRAY NOZZLES
PCTPCTUS2003001668
→
METHOD OF PROCESSING SUBSTRATES USING PRESSURIZED MIST GENERATION
App. No. 10/304,583
→
NEXTGEN WET PROCESS TANK
App. No. 10/117,778
→
MEMBRANE DRYER
App. No. 10/117,739
→
CHEMICAL CONCENTRATION CONTROL DEVICE
App. No. 10/117,725
→
PROCESS TANK WITH PRESSURIZED MIST GENERATION
App. No. 10/117,768
→
DRYING VAPOR GENERATION
App. No. 10/098,847
→
CLEANING AND DRYING METHOD AND APPARATUS
App. No. 10/091,011
→
METHOD AND SYSTEM FOR CHEMICAL INJECTION IN SILICON WAFER PROCESSING
App. No. 10/053,364
→
LOW PROFILE WAFER CARRIER
App. No. 10/053,449
→
SYSTEM FOR REMOVAL OF PHOTORESIST USING SPARGER
App. No. 10/052,823
→
PARTICLE BARRIER DRAIN
App. No. 10/014,121
→