Patent Assignment
Reel/Frame 016248/0011
Assignment of Assignor's Interest
Recorded: 2005-02-07
Pages: 2
Assignee
FUJI PHOTO FILM CO., LTD.
210, NAKANUMA, MINAMI-ASHIGARA-SHI, KANAGAWA, JAPAN
Covered Property
(1)
Resist Composition for Immersion Exposure and Pattern Formation Method Using the Same
Related Assignments
(1)
Other recorded transfers of the patent in this record — the chain of ownership.