IP Library Assignment 016382/0560
Patent Assignment
Reel/Frame 016382/0560

Assignment of Assignor's Interest

Recorded: 2005-03-11 Pages: 2
Assignors
INABE, HARUKI
Executed: 2005-02-28
KANNA, SHINICHI
Executed: 2005-02-28
KANDA, HIROMI
Executed: 2005-02-28
Assignee
FUJI PHOTO FILM CO., LTD.
210, NAKANUMA, MINAMI-ASHIGARA-SHI, KANAGAWA, JAPAN
Covered Property (1)
Positive Resist Composition for Immersion Exposure and Pattern-Forming Method Using the Same
Patent: 7,906,268 →
Application: 11/077,012 →
Publication: US 2005/0208419
Related Assignments (1)
Other recorded transfers of the patent in this record — the chain of ownership.
Assignment of Assignor's Interest Feb 15, 2007
From: FUJIFILM HOLDINGS CORPORATION (FORMERLY FUJI PHOTO FILM CO., LTD.)
To: FUJIFILM CORPORATION
Reel/Frame 018904/0001 →