Assignment of Assignor's Interest

Recorded: 2005-03-24 Pages: 3

Assignor

ABE, DAISUKE

Executed: 2005-03-22

Assignee

SEIKO EPSON CORPORATION

4-1, NISHI-SHINJUKU 2-CHOME, SHINJUKU-KU, TOKYO 163-0811, JAPAN

Covered Property (1)

Method of Manufacturing Semiconductor Device Using Liquid Phase Deposition of an Interlayer Dielectric

Patent: 7,384,827 →

Application: 11/088,973 →

Publication: US 2005/0233575

Related Assignments (1)

Other recorded transfers of the patent in this record — the chain of ownership.