Patent Assignment
Reel/Frame 016462/0844
Assignment of Assignor's Interest
Recorded: 2005-08-27
Pages: 3
Assignor
GHYSELEN, BRUNO
Executed: 2005-07-11
Assignee
S.O.I.TEC SILICON ON INSULATOR TECHNOLOGIES S.A.
PARC TECHNOLOGIQUE DES FONTAINES, F-38190 BERNIN, F-38190, FRANCE
Covered Property
(1)
Method for Forming a Relaxed or Pseudo-Relaxed Useful Layer on a Substrate