IP Library Assignment 016817/0108
Patent Assignment
Reel/Frame 016817/0108

Assignment of Assignor's Interest

Recorded: 2005-07-26 Pages: 3
Assignors
HASEBE, KAZUHIDE
Executed: 2005-07-13
OKADA, MITSUHIRO
Executed: 2005-07-13
CHOU, PAO-HWA
Executed: 2005-07-13
KIM, CHAEHO
Executed: 2005-07-13
OGAWA, JUN
Executed: 2005-07-13
Assignee
TOKYO ELECTRON LIMITED
3-6, AKASAKA 5-CHOME, MINATO-KU, TOKYO, 107-8481, JAPAN
Covered Property (1)
Film Formation Method and Apparatus for Semiconductor Process for Forming a Silicon Nitride Film
Patent: 7,462,571 →
Application: 11/188,736 →
Publication: US 2006/0032443