IP Library Assignment 016944/0441
Patent Assignment
Reel/Frame 016944/0441

Assignment of Assignor's Interest

Recorded: 2005-08-31 Pages: 2
Assignors
KITSUNAI, HIROYUKI
Executed: 2005-08-22
KANNO, SEIICHIRO
Executed: 2005-08-22
TSUBONE, TSUNCHIKO
Executed: 2005-08-24
Assignee
HITACHI HIGH-TECHNOLOGIES CORPORATION
1-24-14, NISHI SHIMBASHI, MINATO-KU, TOKYO 105-8717, JAPAN
Covered Property (1)
Plasma Processing Apparatus and Plasma Processing Method
Patent: 7,567,422 →
Application: 11/214,861 →
Publication: US 2007/0035908
Related Assignments (1)
Other recorded transfers of the patent in this record — the chain of ownership.
Corrective Assignment to Correct the Conveying Party Name, Previously Recorded at Reel 016944, Frame 0441. Jan 27, 2006
From: KITSUNAI, HIROYUKI; KANNO, SEIICHIRO; TSUBONE, TSUNEHIKO
To: HITACHI HIGH-TECHNOLOGIES CORPORATION
Reel/Frame 017516/0701 →