IP Library Assignment 017122/0789
Patent Assignment
Reel/Frame 017122/0789

Assignment of Assignor's Interest

Recorded: 2005-10-19 Pages: 3
Assignors
CHOU, LIN-EN
Executed: 2005-09-28
TING, HUNG-CHE
Executed: 2005-09-28
Assignee
INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
NO. 195, SEC.4, CHUNG-HSING RD., CHU-TUNG, HSINCHU, R.O.C., TAIWAN
Covered Property (1)
Method for Forming a Silicon Oxynitride Layer
Patent: 7,226,871 →
Application: 11/252,560 →
Publication: US 2006/0148140
Related Assignments (2)
Other recorded transfers of the patent in this record — the chain of ownership.
Assignment of Assignor's Interest Mar 26, 2011
From: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
To: ABOMEM TECHNOLOGY CORPORATION
Reel/Frame 026026/0842 →
Assignment of Assignor's Interest May 31, 2011
From: ABOMEM TECHNOLOGY CORPORATION
To: CHINA STAR OPTOELECTRONICS INTERNATIONAL (HK) LIMITED
Reel/Frame 026364/0978 →