Patent Assignment
Reel/Frame 017237/0365
Assignment of Assignor's Interest
Recorded: 2005-11-18
Received: 2005-11-22
Pages: 3
Assignors
CHAU, ROBERT S.
Executed: 2005-11-02
DATTA, SUMAN
Executed: 2005-11-02
DOCZY, MARK L.
Executed: 2005-11-02
DOYLE, BRAIN S.
Executed: 2005-11-02
JIN, BEEN-YIH
Executed: 2005-11-02
KAVALIEROS, JACK T.
Executed: 2005-11-02
METZ, MATTHEW V.
Executed: 2005-11-02
BRASK, JUSTIN K.
Executed: 2005-11-06
Assignee
INTEL CORPORATION
2200 MISSION COLLEGE BOULEVARD, SANTA CLARA, CA, 95052, UNITED STATES
Covered Properties
(2)
Method of fabricating CMOS devices having a single work function gate electrode by band gap engineering and article made thereby
Application:
11/238,445 →
Method of forming surface seeded particulate
Application:
10/653,671 →