Assignment of Assignor's Interest

Recorded: 2006-01-17 Pages: 4

Assignors

IWASHITA, JYUN

Executed: 2006-01-06

HIRAYAMA, TAKU

Executed: 2006-01-06

TACHIKAWA, TOSHIKAZU

Executed: 2006-01-06

Assignee

TOKYO OHKA KOGYO CO., LTD.

150 NAKAMARUKO, NAKAHARA-KU, KAWASAKI-SHI, KANAGAWA 211-0012, JAPAN

Covered Property (1)

Resist material for liquid immersion lithography process and method for forming resist pattern using the resist material

Application: 10/545,915 →

Publication: US 2006/0110676

Related Assignments (1)

Other recorded transfers of the patent in this record — the chain of ownership.