Assignment of Assignor's Interest

Recorded: 2006-02-17 Pages: 2

Assignor

KAWANISHI, YASUTOMO

Executed: 2006-02-13

Assignee

FUJI PHOTO FILM CO., LTD.

210, NAKANUMA, MINAMI-ASHIGARA-SHI, KANAGAWA, JAPAN

Covered Property (1)

Resist Composition, Compound for Use in the Resist Composition and Pattern Forming Method Using the Resist Composition

Patent: 7,541,131 →

Application: 11/356,048 →

Publication: US 2006/0194147

Related Assignments (1)

Other recorded transfers of the patent in this record — the chain of ownership.