Assignment of Assignor's Interest

Recorded: 2006-03-23 Pages: 2

Assignor

AKATSUKA, TOMOHIKO

Executed: 2006-03-17

Assignee

FUJI PHOTO FILM CO., LTD.

210, NAKANUMA, MINAMI-ASHIGARA-SHI, KANAGAWA, JAPAN

Covered Property (1)

Chemical and mechanical polishing method and polishing liquid using therefor

Application: 11/386,790 →

Publication: US 2006/0216936

Related Assignments (1)

Other recorded transfers of the patent in this record — the chain of ownership.