IP Library Assignment 018539/0528
Patent Assignment
Reel/Frame 018539/0528

Assignment of Assignor's Interest

Recorded: 2006-11-20 Pages: 6
Assignors
SHAMIRYAN, DENIS
Executed: 2006-11-17
PARASCHIV, VASILE
Executed: 2006-11-17
DEMAND, MARC
Executed: 2006-11-17
Assignee
INTERUNIVERSITAIR MICROELEKTRONICA CENTRUM (IMEC)
KAPELDREEF 75, LEUVEN, 3001, BELGIUM
Covered Property (1)
Plasma Composition for Selective High-K Etch
Patent: 7,598,184 →
Application: 11/585,564 →
Publication: US 2007/0099403