IP Library › Assignment 018623/0083
Patent Assignment
Reel/Frame 018623/0083

Assignment of Assignor's Interest

Recorded: 2005-01-28 Pages: 3
Assignor
KATO, MASAAKI
Executed: 2004-12-06
Assignee
PURETRON LTD.
2023-15, ENDO, FUJISAWA-SHI, KANAGAWA 252-0816, JAPAN
Covered Property (1)
Technique on Ozone Water for Use in Cleaning Semiconductor Substrate
Patent: 7,678,200 →
Application: 10/522,717 →
Publication: US 2006/0154837
Related Assignments (5)
Other recorded transfers of the patent in this record — the chain of ownership.
Assignment of Assignor's Interest Jan 28, 2005
From: TAKEMURA, MAKOTO; FUKUDA, YASUO; SOUDA, KAZUAKI
To: SUMITOMO MITSUBISHI SILICON CORPORATION
Reel/Frame 018691/0667 →
Assignment of Assignor's Interest Jan 28, 2005
From: SUHARA, EIJI
To: ECHO GIKEN CO., LTD.
Reel/Frame 018741/0810 →
Assignment of Assignor's Interest Feb 23, 2006
From: PURETRON, LTD.
To: CHLORINE ENGINEERS CORP., LTD.
Reel/Frame 018101/0194 →
Assignment of Assignor's Interest May 27, 2014
From: CHLORINE ENGINEERS CORP., LTD.
To: PERMELEC ELECTRODE LTD.
Reel/Frame 032967/0885 →
Change of Name Feb 2, 2016
From: PERMELEC ELECTRODE LTD.
To: DE NORA PERMELEC LTD
Reel/Frame 037679/0984 →