Patent Assignment
Reel/Frame 018730/0618
Assignment of Assignor's Interest
Recorded: 2007-01-09
Pages: 3
Assignee
RENESAS TECHNOLOGY CORP.
4-1, MARUNOUCHI 2-CHOME,, CHIYODA-KU, TOKYO, 100-6334, JAPAN
Covered Property
(1)
Method for Smoothing a Resist Pattern Prior to Etching a Layer Using the Resist Pattern
Related Assignments
(1)
Other recorded transfers of the patent in this record — the chain of ownership.