IP Library › Assignment 019175/0843
Patent Assignment
Reel/Frame 019175/0843

Assignment of Assignor's Interest

Recorded: 2007-04-18 Pages: 4
Assignors
FUTASE, TAKUYA
Executed: 2007-02-01
TSUGANE, HIDEAKI
Executed: 2007-02-01
KIMOTO, MITSUO
Executed: 2007-02-01
SUZUKI, HIDENORI
Executed: 2007-02-06
Assignee
RENESAS TECHNOLOGY CORP.
4-1, MARUNOUCHI 2-CHOME, CHIYODA-KU,, TOKYO, JAPAN
Covered Property (1)
Method of Dry Cleaning Silicon Surface Prior to Forming Self-Aligned Nickel Silicide Layer
Patent: 7,566,662 →
Application: 11/733,316 →
Publication: US 2007/0238321
Related Assignments (2)
Other recorded transfers of the patent in this record — the chain of ownership.
Merger Jul 30, 2010
From: RENESAS TECHNOLOGY CORP.
To: RENESAS ELECTRONICS CORPORATION
Reel/Frame 025204/0512 →
Change of Address Nov 29, 2017
From: RENESAS ELECTRONICS CORPORATION
To: RENESAS ELECTRONICS CORPORATION
Reel/Frame 044928/0001 →