IP Library › Assignment 019694/0079
Patent Assignment
Reel/Frame 019694/0079

Assignment of Assignor's Interest

Recorded: 2007-07-27 Pages: 2
Assignors
HATAKEYAMA, JUN
Executed: 2007-07-13
FUJI, TOSHIHIKO
Executed: 2007-07-13
OHSAWA, YOUICHI
Executed: 2007-07-13
Assignee
SHIN-ETSU CHEMICAL CO., LTD.
6-1, OTEMACHI 2-CHOME, CHIYODA-KU, TOKYO, JAPAN
Covered Property (1)
Resist Lower Layer Material, Resist Lower Layer Substrate Comprising the Material and Method for Forming Pattern
Patent: 7,871,761 →
Application: 11/881,761 →
Publication: US 2008/0032231
Related Assignments (2)
Other recorded transfers of the patent in this record — the chain of ownership.
Release of Security Interest Feb 5, 2026
From: FISH & RICHARDSON P.C.
To: TAE TECHNOLOGIES
Reel/Frame 074718/0509 →
Release of Security Interest Feb 9, 2026
From: FISH & RICHARDSON P.C.
To: TAE TECHNOLOGIES
Reel/Frame 074944/0866 →