Patent Assignment
Reel/Frame 020067/0821
Assignment of Assignor's Interest
Recorded: 2007-10-26
Pages: 3
Assignee
PHYZCHEMIX CORPORATION
ATT EAST 11F, 17-22, AKASAKA 2-CHOME, MINATO-KU, TOKYO 107-0052, JAPAN
Covered Property
(1)
Etching method, method for producing dielectric film of low dielectric constant, method for producing porous member, etching system and thin film forming equipment
Application:
11/919,341 →
Publication:
US 2010/0062602
Related Assignments
(2)
Other recorded transfers of the patent in this record — the chain of ownership.
Assignment of Assignor's Interest
Nov 21, 2008
From: PHYZCHEMIX CORPORATION
To: CANON AVELVA CORPORATION
Reel/Frame 021915/0398 →
Corrective Assignment to Correct the Assignee Name from Canon Avelva Corporation to Canon Anelva Corporation Previously Recorded on Reel 021915 Frame 0398. Assignor(S) Hereby Confirms the Assignment.
Dec 31, 2008
From: PHYZCHEMIX CORPORATION
To: CANON ANELVA CORPORATION
Reel/Frame 022059/0972 →