Patent Assignment
Reel/Frame 020205/0938
Assignment of Assignor's Interest
Recorded: 2007-12-06
Pages: 5
Assignors
HWANG, ERIC, MR.
Executed: 2007-12-06
WANG, JINLIU, MR.
Executed: 2007-10-25
WHITE, RICHARD LONGSTRETH, MR.
Executed: 2007-10-24
Assignee
HITACHI GLOBAL STORAGE TECHNOLOGIES NETHERLANDS BV
LOCATELLIKADE 1, PARNASSUSTOREN, 1076 AZ AMSTERDAM, NETHERLANDS
Covered Property
(1)
System, Method and Apparatus for Filament and Support Used in Plasma-Enhanced Chemical Vapor Deposition for Reducing Carbon Voids on Media Disks in Disk Drives
Related Assignments
(2)
Other recorded transfers of the patent in this record — the chain of ownership.