IP Library Assignment 020257/0848
Patent Assignment
Reel/Frame 020257/0848

Assignment of Assignor's Interest

Recorded: 2007-12-17 Pages: 4
Assignors
KATO, HITOSHI
Executed: 2005-11-11
FUKUSHIMA, KOHEI
Executed: 2005-11-11
YONEZAWA, MASATO
Executed: 2005-11-11
HIRAKA, JUNYA
Executed: 2005-11-11
Assignee
TOKYO ELECTRON LIMITED
3-6, AKASAKA 5-CHOME, MINATO-KU, TOKYO, 107-8481, JAPAN
Covered Property (1)
Cvd Method for Forming Silicon Nitride Film
Patent: 7,462,376 →
Application: 10/558,217 →
Publication: US 2006/0286817