Assignment of Assignor's Interest

Recorded: 2008-03-12 Pages: 3

Assignor

LIU, GUO LIN

Executed: 2008-02-12

Assignee

OKI ELECTRIC INDUSTRY CO., LTD.

7-12, TORANOMON 1-CHOME, MINATO-KU, TOKYO, 105-8460, JAPAN

Covered Property (1)

Method of Fabricating a Semiconductor Device with a Porous Dielectric Film

Application: 12/046,522 →

Publication: US 2008/0248644

Related Assignments (1)

Other recorded transfers of the patent in this record — the chain of ownership.