Patent Assignment
Reel/Frame 020657/0362
Assignment of Assignor's Interest
Recorded: 2008-03-17
Pages: 3
Assignor
RENN, SHING-HWA
Executed: 2008-03-14
Assignee
NANYA TECHNOLOGY CORP.
HWA-YA TECHNOLOGY PARK 669, FUHSING 3 RD., KUEISHAN, TAO-YUAN HSIEN, TAIWAN
Covered Property
(1)
Dram Device Having a Gate Dielectric Layer with Multiple Thicknesses