Patent Assignment
Reel/Frame 020675/0981
Assignment of Assignor's Interest
Recorded: 2008-03-19
Pages: 9
Assignors
COLLAERT, NADINE
Executed: 2008-01-14
ZIMMERMAN, PAUL
Executed: 2008-01-15
DEMAND, MARC
Executed: 2008-01-15
BOULLART, WERNER
Executed: 2008-02-20
SHICKOVA, ADELINA K.
Executed: 2008-01-16
Assignees
INTERUNIVERSITAIR MICROELEKTRONICA CENTRUM VZW (IMEC)
KAPELDREEF 75, LEUVEN, 3001, BELGIUM
KATHOLIEKE UNIVERSITEIT LEUVEN, K.U. LEUVEN R&D
MINDERBROEDERSSTRAAT 8A, BUS 5105, LEUVEN, 3000, BELGIUM
Covered Property
(1)
Use of F-Based Gate Etch to Passivate the High-K/Metal Gate Stack for Deep Submicron Transistor Technologies
Related Assignments
(1)
Other recorded transfers of the patent in this record — the chain of ownership.