IP Library › Assignment 020741/0805
Patent Assignment
Reel/Frame 020741/0805

Assignment of Assignor's Interest

Recorded: 2008-04-03 Pages: 2
Assignor
Assignee
SHARP KABUSHIKI KAISHA
22-22, NAGAIKE-CHO, ABENO-KU, OSAKA, 545-8522, JAPAN
Covered Property (1)
Selective Etching Processes of Silicon Nitride and Indium Oxide Thin Films for Feram Device Applications
Patent: 7,338,907 →
Application: 10/958,537 →
Publication: US 2006/0073706
Related Assignments (1)
Other recorded transfers of the patent in this record — the chain of ownership.
Assignment of Assignor's Interest Oct 4, 2004
From: LI, TINGKAI; HSU, SHENG TENG; ULRICH, BRUCE D.; BURGHOLZER, MARK A.
To: SHARP LABORATORIES OF AMERICA, INC.
Reel/Frame 015880/0687 →