Assignment of Assignor's Interest

Recorded: 2008-03-27 Pages: 3

Assignors

ISHIBASHI, TAKEO

Executed: 2008-03-20

TERAI, MAMORU

Executed: 2008-03-20

HAGIWARA, TAKUYA

Executed: 2008-03-20

YAMAGUCHI, ATSUMI

Executed: 2008-03-20

Assignee

RENESAS TECHNOLOGY CORP.

6-2, OTEMACHI 2-CHOME, CHIYODA-KU, TOKYO, 100-0004, JAPAN

Covered Property (1)

Method of forming resist pattern and semiconductor device manufactured with the same

Application: 12/078,098 →

Publication: US 2008/0241489

Related Assignments (1)

Other recorded transfers of the patent in this record — the chain of ownership.