Assignment of Assignor's Interest

Recorded: 2008-06-02 Pages: 4

Assignors

MORI, SHIGERU

Executed: 2008-05-16

TANABE, HIROSHI

Executed: 2008-05-16

TANAKA, JUN

Executed: 2008-05-16

Assignee

NEC LCD TECHNOLOGIES, LTD.

1753 SHIMONUMABE, NAKAHARA-KU, KAWASAKI, KANAGAWA, 211-8666, JAPAN

Covered Property (1)

Silicon Oxide Film, Production Method Therefor and Semiconductor Device Having Gate Insulation Film Using the Same

Patent: 8,330,193 →

Application: 12/131,249 →

Publication: US 2008/0296580

Related Assignments (1)

Other recorded transfers of the patent in this record — the chain of ownership.