Patent Assignment
Reel/Frame 021056/0030
Assignment of Assignor's Interest
Recorded: 2008-05-23
Pages: 6
Assignors
GOH, LUONA
Executed: 2008-05-22
TIAN, JINGZE
Executed: 2008-05-22
LU, WEI
Executed: 2008-05-22
ZHOU, MEI SHENG
Executed: 2008-05-23
Assignee
CHARTERED SEMICONDUCTOR MANUFACTURING, LTD.
60 WOODLANDS INDUSTRIAL PARK D, STREET 2, 738406, SINGAPORE
Covered Property
(1)
High shrinkage stress silicon nitride (SiN) layer for NFET improvement
Application:
12/154,605 →
Publication:
US 2009/0289284
Related Assignments
(2)
Other recorded transfers of the patent in this record — the chain of ownership.