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Patent Assignment
Reel/Frame 021179/0694

ASSIGNMENT OF ASSIGNOR'S INTEREST

Recorded: 2008-07-01 Received: 2008-07-01 Pages: 3
Assignor
HOLME, ROBERTS & OWEN
Executed: 2006-12-22
Assignee
HOLME, ROBERTS & OWEN
299 SOUTH MAIN STREET, SUITE 1800, SALT LAKE CITY, UT, 84111, UNITED STATES
Covered Application (1)
Simultaneous Formation of a Top Oxide Layer in a Silicon-Oxide-Nitride-Oxide-Silicon (SONOS) Transistor and a Gate Oxide in a Metal Oxide Semiconductor (MOS)
App. No. 11/615,683
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