IP Library Assignment 021189/0454
Patent Assignment
Reel/Frame 021189/0454

Assignment of Assignor's Interest

Recorded: 2008-06-23 Pages: 13
Assignors
ZHANG, BAICHAO
Executed: 2008-06-03
WIDODO, JOHNNY
Executed: 2008-06-03
TAN, JUAN BOON
Executed: 2008-06-11
SIEW, YONG KONG
Executed: 2008-06-03
ZHANG, FAN
Executed: 2008-06-03
SHENG, HAIFENG
Executed: 2008-06-03
LIN, WENHE
Executed: 2008-06-03
TEH, YOUNG WAY
Executed: 2008-06-11
LIU, JINPING
Executed: 2008-06-05
HO, VINCENT
Executed: 2008-06-03
HSIA, LIANG CHOO
Executed: 2008-06-12
Assignee
CHARTERED SEMICONDUCTOR MANUFACTURING, LTD.
60 WOODLANDS INDUSTRIAL PARK D, STREET 2, SINGAPORE, 738406, SINGAPORE
Covered Property (1)
Implantation for shallow trench isolation (STI) formation and for stress for transistor performance enhancement
Application: 12/214,854 →
Publication: US 2009/0315115
Related Assignments (2)
Other recorded transfers of the patent in this record — the chain of ownership.
Change of Name Jun 2, 2010
From: CHARTERED SEMICONDUCTOR MANUFACTURING LTD.
To: CHARTERED SEMICONDUCTOR MANUFACTURING PTE. LTD.
Reel/Frame 024476/0268 →
Change of Name Jun 2, 2010
From: CHARTERED SEMICONDUCTOR MANUFACTURING PTE. LTD.
To: GLOBALFOUNDRIES SINGAPORE PTE. LTD.
Reel/Frame 024476/0275 →