Patent Assignment
Reel/Frame 021608/0370
Assignment of Assignor's Interest
Recorded: 2008-09-30
Pages: 5
Assignors
TERASAWA, TSUNEO
Executed: 2008-09-12
TANAKA, TOSHIHIKO
Executed: 2008-09-12
AOTA, TATSUYA
Executed: 2008-09-22
Assignee
RENESAS TECHNOLOGY CORP.
6-2, OTEMACHI 2-CHOME, CHIYODA-KU,, TOKYO, 100-0004, JAPAN
Covered Property
(1)
Apparatus and a Method for Inspection of a Mask Blank, a Method for Manufacturing a Reflective Exposure Mask, a Method for Reflective Exposure, and a Method for Manufacturing Semiconductor Integrated Circuits
Related Assignments
(2)
Other recorded transfers of the patent in this record — the chain of ownership.